Intel je prvo podjetje, ki je naredilo enega največjih napredkov v temeljni zasnovi tranzistorja, s tem da namerava v svojem 45-nanometrskem proizvodnem postopku uporabiti inovativno kombinacijo novih materialov, ki znatno zmanjšajo izgubo elektrike iz tranzistorjev in povečajo njihovo zmogljivost. Podjetje bo v letošnjem letu pričelo s proizvodnjo izdelkov, narejenih s proizvodnim procesom, v katerem bo uporabilo nov material, imenovan "high-k", za dielektrik tranzistorjevih vrat in novo kombinacijo kovinskih materialov za elektrodo tranzistorjevih vrat.
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